博士論文

ゲート酸化膜欠陥に起因する集積回路の信頼性と実測評価

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ゲート酸化膜欠陥に起因する集積回路の信頼性と実測評価

Material type
博士論文
Author
岸田, 亮
Publisher
-
Publication date
2018-03-26
Material Format
Digital
Capacity, size, etc.
-
Name of awarding university/degree
京都工芸繊維大学,博士(工学)
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Notes on use

Note (General):

type:Thesis本学位論文は,半導体集積回路におけるゲート酸化膜中欠陥に起因するBTI (Bias Temperature Instability),アンテナダメージ,RTN (Random Telegraph Noise)の信頼性問題を回路レベルで評価している.BTIは経年劣化現象の1つであ...

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fulltext
  • http://repository.lib.kit.ac.jp/repo/repository/10212/2467/D1-0872_h1.pdf fulltext

  • http://repository.lib.kit.ac.jp/repo/repository/10212/2467/D1-0872.pdf fulltext

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Digital

Material Type
博士論文
Author/Editor
岸田, 亮
Author Heading
Publication Date
2018-03-26
Publication Date (W3CDTF)
2018-03-26
Alternative Title
Measurements and Evaluations of Reliability Issues Caused by Gate Oxide Defects in Semiconductor Chips
Degree grantor/type
京都工芸繊維大学
Date Granted
2018-03-26
Dissertation Number
甲第872号