文書・図像類

Study of oxygen atom diffusion coefficient in silicon melts

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Study of oxygen atom diffusion coefficient in silicon melts

Material type
文書・図像類
Author
寺嶋, 一高ほか
Publisher
宇宙開発事業団
Publication date
2002-12-27
Material Format
Digital
Capacity, size, etc.
-
NDC
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Notes on use

Note (General):

The oxygen diffusion has been studied by using the capillary technique. As the initial stage of quartz dissolution into silicon melts causes an experi...

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    Digital
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Digital

Material Type
文書・図像類
Author/Editor
寺嶋, 一高
西村, 鈴香
北村, 大剛
Terashima, Kazutaka
Nishimura, Suzuka
Kitamura, Daigo
Publication, Distribution, etc.
Publication Date
2002-12-27
Publication Date (W3CDTF)
2002-12-27
Alternative Title
溶融シリコン中の酸素原子拡散係数の研究
Periodical title
宇宙開発事業団技術報告: Modeling and Precise Experiments of Diffusion Phenomena in Melts Under Microgravity: Annual Reports 2001 = NASDA Technical Memorandum: Modeling and Precise Experiments of Diffusion Phenomena in Melts Under Microgravity: Annual Reports 2001
Pages
143-145