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文書・図像類

ホウ化物薄膜のエピタキシャル成長における表面・界面制御

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ホウ化物薄膜のエピタキシャル成長における表面・界面制御

Material type
文書・図像類
Author
高村, 由起子
Publisher
-
Publication date
2010-06-17
Material Format
Digital
Capacity, size, etc.
-
NDC
-
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Notes on use

Note (General)：

薄膜中への酸素や水分の混入を防ぎ、かつ、成長表面のその場観察が可能な気相成長装置を立ち上げ、高融点かつ高電気伝導性を有する二ホウ化ジルコニウムの薄膜をシリコン、サファイア、窒化ガリウム上にエピタキシャル成長した。成長中の表面再構成構造のその場観察から、基板由来の元素が表面反応に大きく寄与していること...

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Digital

Material Type
文書・図像類
Title
ホウ化物薄膜のエピタキシャル成長における表面・界面制御
Author/Editor
高村, 由起子
Author Heading
高村, 由起子
Publication Date
2010-06-17
Publication Date (W3CDTF)
2010-06-17
Alternative Title
Surface and interface control in the epitaxial growth of boride thin films
Periodical title
科学研究費補助金研究成果報告書
Pages
1-5
Text Language Code
jpn