大阪大学極限科学研究センター報告書 = Report Kyokugen

• Material Type: 雑誌
• ISSN: 1344-2546
• ISSN-L: 1344-2546
• Title: 大阪大学極限科学研究センター報告書
• Title Transcription: オオサカ ダイガク キョクゲン カガク ケンキュウ センター ホウコクショ
• Volume: (7)-(8) 20020000-20030000
• Author/Editor: 大阪大学極限科学研究センター 編
• Author/Editor (Alternative Title): Research Center for Materials Science at Extreme Conditions, Osaka University
• Author Heading: 大阪大学極限科学研究センター オオサカ ダイガク キョクゲン カガク ケンキュウ センター ( 01026224 )Authorities
• Publication, Distribution, etc.: 豊中 : 大阪大学極限科学研究センター
• Publication Date: 2002-2003
• Publication Date (W3CDTF): 2002-2003
• Year and volume of publication: No. 1 (1996)-no. 10 (2005)
• Size: 30cm
• Alternative Title: Report Kyokugen Report Kyokugen; Report Kyokugen; Report
• Place of Publication (Country Code): JP
• Text Language Code: jpn; eng
• NDLC: ZM35
• Note (General): 本タイトル等は最新号による; 並列タイトル変遷: Report / Research Center for Materials Science at Extreme Conditions, Osaka University (no. 1-no. 6)
• Holding library: 国立国会図書館
• Call No.: Z15-B127
• Related Material: 関連資料; https://ndlsearch.ndl.go.jp/books/R100000002-I000008973332
• Replaces: 継続前; https://ndlsearch.ndl.go.jp/books/R100000002-I000000077597
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000000102060; http://id.ndl.go.jp/bib/000000102060
• National Bibliography No. (JPNO): 00107906
• Cataloging Rule: National Diet Library Cataloging Rules for Serials
• Bibliographic Record Category (NDL): 131

Table of Contents

Evaluation of Soft Errors in DRAM and SRAM Using Nuclear Microprobe and Neutron Source

Wavelength Dependence of Laser Cleaning for Field Emitter Arrays

Development of Enhanced Depth-Resolution Technique for Shallow Dopant Profile

Medium Energy Ion-Nanoprobe with TOF-RBS for Semiconductor Process Analysis

Emission Site Control in Carbon Nanotube Field Emitters by Focused Ion and Laser Beam Irradiation

Ion Beam Induced Epitaxial Crystallization of Silicon Implanted with Heavy Ions

Development of Nanoprobe TOF-RBS System for Semiconductor Process

Nanometer resolution three-dimensional microprobe RBS analyses by using a 200 kV focused ion beam system

Investigation of floating body effects in PD-SOI-MOSFET using proton microprobe

Fabrication of Nano Electron Source Using Beam-Assisted Process