Ultra Clean Technology2(1);1991

• Material Type: 雑誌
• Title: Ultra Clean Technology
• Volume: 2(1);1991
• Publication, Distribution, etc.: Tokyo : Ultra Clean Society
• Publication Date: 1991
• Publication Date (W3CDTF): 1991
• Year and volume of publication: 1(1):1990 -
• Size: 30 cm
• ISSN (Periodical Title): 0917-0375
• ISSN-L (Periodical Title): 0917-0375
• Place of Publication (Country Code): JP
• Text Language Code: eng
• NDLC: ZN33; ZM35
• Note (General): Description based on the latest issue
• DOI: 10.11501/11026035; https://doi.org/10.11501/11026035
• Persistent ID (NDL): info:ndljp/pid/11026035; https://dl.ndl.go.jp/pid/11026035
• Collection (particular): 国立国会図書館デジタルコレクション > デジタル化資料 > 雑誌; https://dl.ndl.go.jp/collections/A00002
• Producer: 国立国会図書館
• Production year (W3CDTF): 2018-03-09
• Date Accepted (W3CDTF): 2018-01-15T18:38:32+09:00
• Format (IMT): image/jp2
• Access Restrictions: 国立国会図書館内限定公開
• Service for the Digitized Contents Transmission Service: 図書館・個人送信対象
• Availability of remote photoduplication service: 可
• Year and volume of holding: 1(1):1990 - 2(1):1991
• Call No.: Z54-G879
• Original Material (JPNO): 10044347
• Periodical Title (Persistent ID (NDL)): info:ndljp/pid/11028906; https://dl.ndl.go.jp/pid/11028906
• Data Provider (Database): 国立国会図書館 : 国立国会図書館デジタルコレクション; https://dl.ndl.go.jp

Table of Contents

CONTENTS/

Preface//1～2

Future in Photoresist Process Technology for Deep Submicron Era/Takahisa NITTA/1～2

Special Issue//3～47

Issues about Resist Materials and the Trends in Future/Hatsuyuki TANAKA ; Akira YOKOTA/3～10