Journal of photopolymer science and technology

• Material Type: 雑誌
• ISSN: 0914-9244
• ISSN-L: 0914-9244
• Title: Journal of photopolymer science and technology
• Volume: 12(1)-12(5):1999
• Author Heading: フォトポリマー学会 フォトポリマー ガッカイ ( 001142273 )Authorities; Conference of Photopolymer Science and Technology ( 01236612 )Authorities; フォトポリマー懇話会 フォトポリマー コンワカイ ( 00283295 )Authorities
• Publication, Distribution, etc.: Chiba : The Society of Photopolymer Science and Technology
• Publication Date: 1999
• Publication Date (W3CDTF): 1999
• Note (Publication, distribution, etc.): Place of publication varies; Publisher: Technical Association of Photopolymers, Japan (v. 6, no. 1-v. 23, no. 6); The Conference of Photopolymer Science and Technology (v. 24, no. 1-v. 25, no. 6)
• Year and volume of publication: v. 6, no. 1 (1993)-
• Size: 29cm
• Place of Publication (Country Code): JP
• Text Language Code: eng
• NDLC: ZP48
• Note (General): Description based on the latest issue; Frequency varies
• Holding library: 国立国会図書館
• Call No.: Z53-W515
• Related Material: 区分換; https://ndlsearch.ndl.go.jp/books/R100000002-I000000065969
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000000156586; http://id.ndl.go.jp/bib/000000156586
• National Bibliography No. (JPNO): 10050993
• Cataloging Rule: National Diet Library Cataloging Rules for Serials
• Bibliographic Record Category (NDL): 132

Table of Contents

Novel Organic Resists for Nanoscale Imaging:from Chemically Amplified Cycloaliphatic Resists to Dendrimer Monolayers

Highly Integrated Single Electron Devices and Giga-bit Lithography

Advances in Resist Materials for 193 nm Lithography

193 nm Resists for Deep Sub-Wavelength Applications

Recent Advancements in 193 nm Step and Scan Lithography

The Photopolymer Science and Technology Award

The Photopolymer Science and Technology Award

Chemistry of Sulfur Doping Mechanism in Amorphous Carbon by Plasma CVD of Methane

Preparation of Plasma-grafted Membranes and Their Pervaporation Properties to Aromatic/Non-aromatic Mixtures

Thermo-Responsive Properties of Poly(tetrafluoroethylene)Surfaces Photografted with Hydrophilic Monomers around Ordinary Temperatures

Low Dielectric Constant Materials

Fluorinated Amorphous Carbon Thin Films for Multilevel Interconnections of Integrated Circuits

Characteristic of Low-Dielectric-Constant Porous SOG Material

Preparation and Properties of Porous Polyimide Films Prepared by the Pyrolysis of Poly(urethane-imide)Films

Recent Trends and Space Applications of Polyimides

Novel Diffusion Analysis in Advanced Chemically Amplified DUV Resists Using Photometric Methods

Sensitizer Dyes and Sensitization Mechanisms in Photopolymer Coating Layer 2

Photochemical Reaction of Polymers Used as Resists by 146-nm Light Exposure

Sulfonic Acid Generating Polymers for 146 nm Irradiation

Intramolecular Photodimerization of Bisthymine Compounds

Swelling Analysis of Methacrylate Polymers in Aqueous Alkaline Developer

Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists

Outlook for 157nm Resist Design

Theoretical Estimation of Absorption Coefficients of Various Polymers at 13 nm

Critical-dimension Control for 130-nm Patterns in X-ray Lithography