Investigation on high-concentration arsenic diffusion in silicon

Investigation on high-concentration arsenic diffusion in silicon

Call No. (NDL): UT51-59-J179
Bibliographic ID of National Diet Library: 000000207826

Material type: 博士論文

Author: 大川潭二 [著]

Publisher: -

Publication date: -

Material Format: Paper

Capacity, size, etc.: -

Name of awarding university/degree: 東京工業大学,工学博士

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Note (General)：: 博士論文

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Paper

Material Type: 博士論文
Title: Investigation on high-concentration arsenic diffusion in silicon
Author/Editor: 大川潭二 [著]
Author Heading: 大川, 潭二オオカワ, シンジ
Extent: 冊
Alternative Title: シリコン中の高濃度砒素拡散の研究シリコンチュウノコウノウドヒソカクサンノケンキュウ
Degree grantor/type: 東京工業大学
Date Granted: 昭和59年1月31日
Date Granted (W3CDTF): 1984
Dissertation Number: 乙第1307号
Degree Type: 工学博士
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
NDLC: UT51
UT31
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-59-J179
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000000207826
http://id.ndl.go.jp/bib/000000207826
Bibliographic Record Category (NDL): 213