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Low temperature growth of SiO[2] thin film by direct-excitation photo-induced CVD using VUV light

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Material Type: 博士論文
Title: Low temperature growth of SiO[2] thin film by direct-excitation photo-induced CVD using VUV light
Author/Editor: 井上幸二 [著]
Author Heading: 井上, 幸二イノウエ, コウジ
Alternative Title: 真空紫外光直接励起型光CVD法によるSiO[2]膜の低温成長に関する研究シンクウシガイコウチョクセツレイキガタヒカリ CVDホウニヨル SiO2マクノテイオンセイチョウニカンスルケンキュウ
Degree grantor/type: 大阪大学
Date Granted: 平成1年3月24日
Date Granted (W3CDTF): 1989
Dissertation Number: 甲第3964号
Degree Type: 工学博士
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
NDLC: UT51
UT31
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-89-H309
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000000218773
http://id.ndl.go.jp/bib/000000218773
Bibliographic Record Category (NDL): 213