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分子線エピタキシー法による化合物半導体の結晶成長とガスドーピングの研究

Call No. (NDL): UT51-89-K323
Bibliographic ID of National Diet Library: 000000220653
Persistent ID (NDL): info:ndljp/pid/11599341

Material type: 博士論文

Author: 後藤秀樹 [著]

Publisher: -

Publication date: -

Material Format: Paper・Digital

Capacity, size, etc.: -

Name of awarding university/degree: 早稲田大学,工学博士

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Note (General)：: 博士論文

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Material Type: 博士論文
Title: 分子線エピタキシー法による化合物半導体の結晶成長とガスドーピングの研究
Title Transcription: ブンシセンエピタキシーホウニヨルカゴウブツハンドウタイノケッショウセイチョウトガスドーピングノケンキュウ
Author/Editor: 後藤秀樹 [著]
Author Heading: 後藤, 秀樹ゴトウ, ヒデキ
Degree grantor/type: 早稲田大学
Date Granted: 昭和63年10月13日
Date Granted (W3CDTF): 1988
Dissertation Number: 乙第688号
Degree Type: 工学博士
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
NDLC: UT51
UT31
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-89-K323
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000000220653
http://id.ndl.go.jp/bib/000000220653
Bibliographic Record Category (NDL): 213