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Extended X-ray absorption fine structure studies of amorphous and crystalline Si-Ge alloys with synchrotron radiation

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Material Type: 博士論文
Title: Extended X-ray absorption fine structure studies of amorphous and crystalline Si-Ge alloys with synchrotron radiation
Author/Editor: 梶山博司 [著]
Author Heading: 梶山, 博司カジヤマ, ヒロシ
Alternative Title: 放射光を用いたEXAFS法によるSi-Ge合金の研究ホウシャコウオモチイタ EXAFSホウニヨル Si-Ge ゴウキンノケンキュウ
Degree grantor/type: 広島大学
Date Granted: 昭和63年11月28日
Date Granted (W3CDTF): 1988
Dissertation Number: 乙第1773号
Degree Type: 理学博士
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
NDLC: UT51
UT21
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-89-N331
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000000222023
http://id.ndl.go.jp/bib/000000222023
Bibliographic Record Category (NDL): 213