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Study of low-temperature thermal-oxidation of silicon and its application to thin-film transistors

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Material Type: 博士論文
Title: Study of low-temperature thermal-oxidation of silicon and its application to thin-film transistors
Author/Editor: 張宏勇 [著]
Author Heading: 張, 宏勇チョウ, コウユウ
Alternative Title: シリコンの低温熱酸化とその薄膜トランジスタへの応用に関する研究シリコンノテイオンネツサンカトソノハクマクトランジスタエノオウヨウニカンスルケンキュウ
Degree grantor/type: 東京工業大学
Date Granted: 平成1年3月26日
Date Granted (W3CDTF): 1989
Dissertation Number: 甲第2047号
Degree Type: 工学博士
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Alias of Author: Zhang, Hong-yong
NDLC: UT51
UT31
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-89-V299
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000000224481
http://id.ndl.go.jp/bib/000000224481
Bibliographic Record Category (NDL): 213