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Formation and growth mechanism of fine particles prepared by chemical vapor deposition : preparation of TiO[2] by pyrolysis/hydrosylis of Ti(iso-OC[3]H[7])[4]

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Material Type: 博士論文
Title: Formation and growth mechanism of fine particles prepared by chemical vapor deposition : preparation of TiO[2] by pyrolysis/hydrosylis of Ti(iso-OC[3]H[7])[4]
Author/Editor: Kirkbir, Fikret [著]
Author Heading: Kirkbir, Fikret クックビル, フィクレット
Alternative Title: CVD「化学気相析出法」によって作製した微粒子の生成と成長のメカニズム : Ti(iso-OC[3]H[7])[4]の熱分解および加水分解反応によるTiO[2]の作製 CVD カガクキソウセキシュツホウニヨッテサクセイシタビリュウシノセイセイトセイチョウノメカニズム : Ti(iso-OC3H7)4 ノネツブンカイオヨビカスイブンカイハンノウニヨル TiO2 ノサクセイ
Degree grantor/type: 東京大学
Date Granted: 昭和63年9月30日
Date Granted (W3CDTF): 1988
Dissertation Number: 甲第7922号
Degree Type: 工学博士
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
NDLC: UT51
UT31
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-89-S41
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000000225679
http://id.ndl.go.jp/bib/000000225679
Bibliographic Record Category (NDL): 213