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Ultraclean dual RF excitation plasma etching system for ULSI

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Material Type: 博士論文
Title: Ultraclean dual RF excitation plasma etching system for ULSI
Author/Editor: Goto Haruhiro Harry [著]
Author Heading: Goto Haruhiro Harry ゴトウハルヒロハリー
Alternative Title: ULSI製造用超クリーン二周波励起プラズマエッチング装置 ULSI セイゾウヨウチョウクリーンニシュウハレイキプラズマエッチングソウチ
Degree grantor/type: 東北大学
Date Granted: 平成4年3月18日
Date Granted (W3CDTF): 1992
Dissertation Number: 乙第5779号
Degree Type: 工学博士
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
NDLC: UT51
UT31
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-92-G521
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000000249502
http://id.ndl.go.jp/bib/000000249502
Bibliographic Record Category (NDL): 213