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博士論文

超LSI用シリコンウエハ表面清浄化の研究

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超LSI用シリコンウエハ表面清浄化の研究

Call No. (NDL)
UT51-94-F354
Bibliographic ID of National Diet Library
000000269297
Persistent ID (NDL)
info:ndljp/pid/3074684
Material type
博士論文
Author
三島博之 [著]
Publisher
-
Publication date
-
Material Format
Paper・Digital
Capacity, size, etc.
-
Name of awarding university/degree
東北大学,博士 (工学)
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Table of Contents

Provided by：国立国会図書館デジタルコレクションLink to Help Page

  • 目次

  • 第1章 序論

    p1

  • 1.1 シリコンウエハ洗浄･乾燥技術の重要性

    p1

  • 1.2 本研究の目的

    p2

  • 第2章 高清浄ウエハ洗浄技術

    p5

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Bibliographic Record

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Paper Digital

Material Type
博士論文
Title
超LSI用シリコンウエハ表面清浄化の研究
Title Transcription
チョウLSIヨウ シリコン ウエハ ヒョウメン セイジョウカ ノ ケンキュウ
Author/Editor
三島博之 [著]
Author Heading
三嶋, 博之, 1968- ミシマ, ヒロユキ, 1968- ( 00681491 )Authorities
Degree grantor/type
東北大学
Date Granted
平成6年1月12日
Date Granted (W3CDTF)
1994
Dissertation Number
乙第6226号
Degree Type
博士 (工学)