微細MOSデバイスにおけるゲート酸化膜の特性劣化解析

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微細MOSデバイスにおけるゲート酸化膜の特性劣化解析

Call No. (NDL): UT51-98-J171
Bibliographic ID of National Diet Library: 000000321690
Persistent ID (NDL): info:ndljp/pid/3136498

Material type: 博士論文

Author: 小川重男 [著]

Publisher: -

Publication date: -

Material Format: Paper・Digital

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Name of awarding university/degree: 慶應義塾大学,博士 (工学)

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Note (General)：: 博士論文

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Provided by：国立国会図書館デジタルコレクション

論文目録
目次
p1
記号と説明
p4
序章
p1
0.1 研究の背景
p1

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Paper Digital

Material Type: 博士論文
Title: 微細MOSデバイスにおけるゲート酸化膜の特性劣化解析
Title Transcription: ビサイ MOS デバイスニオケルゲートサンカマクノトクセイレッカカイセキ
Author/Editor: 小川重男 [著]
Author Heading: 小川, 重男オガワ, シゲオ
Degree grantor/type: 慶應義塾大学
Date Granted: 平成10年3月4日
Date Granted (W3CDTF): 1998
Dissertation Number: 乙第3163号
Degree Type: 博士 (工学)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
NDLC: UT51
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-98-J171
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000000321690
http://id.ndl.go.jp/bib/000000321690
Bibliographic Record Category (NDL): 213