Studies on low temperature polycrystalline silicon film formation using electron cyclotron resonance silane/hydrogen plasma

• Material Type: 博士論文
• Title: Studies on low temperature polycrystalline silicon film formation using electron cyclotron resonance silane/hydrogen plasma
• Author/Editor: 野澤陵一 [著]
• Author Heading: 野澤, 陵一 ノザワ, リョウイチ
• Alternative Title: ECRシラン/水素プラズマを用いた多結晶シリコン低温形成に関する研究 ECR シラン
• Degree grantor/type: 名古屋大学
• Date Granted: 平成11年3月25日
• Date Granted (W3CDTF): 1999
• Dissertation Number: 甲第4287号
• Degree Type: 博士(工学)
• Note (Dissertation): 博士論文
• Place of Publication (Country Code): JP
• NDLC: UT51
• Note (General): 博士論文
• Holding library: 国立国会図書館
• Call No.: UT51-99-L467
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000000337304; http://id.ndl.go.jp/bib/000000337304
• Bibliographic Record Category (NDL): 213

Table of Contents

Contents

Chapter1 Introduction

1.1 Applications of microcrystalline silicon and polycrystalline silicon films to electronic devices

1.2 Previous studies on formation techniques and formation mechanisms of microcrystalline silicon and polycrystalline silicon films

1.3 Purpose and composition of this thesis