Proceedings of International Symposium on Dry Process 1;2001
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Table of Contents
The 23rd INTERNATIONAL SYMPOSIUM ON DRY PROCESS PROGRAM//1～6
Tuesday, November 20, 2001//～140
Session I Gate／Metal Etching//～48
I-1 <Invited Talk> Control of Ion Energy Distribution at Substrates During Plasma Etching/Amy E. Wendt ; S. B. Wang/1～9
I-2 High-Efficiency Neutral-Beam Generation using Inductively Coupled Plasma/Keisuke Sakamoto ; Katsunori Ichiki ; Seiji Samukawa/11～15
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Bibliographic Record
You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.
- Material Type
- 雑誌
- Volume
- 1;2001
- Author Heading
- 応用物理学会 オウヨウ ブツリ ガッカイ ( 00281497 )Authorities電気学会 デンキ ガッカイ ( 00259505 )Authorities
- Publication, Distribution, etc.
- Publication Date
- 2001
- Publication Date (W3CDTF)
- 2001
- Note (Publication, distribution, etc.)
- Publisher: Institute of Electrical Engineers of Japan (1st-<6th>)
- Year and volume of publication
- 1st (2001)-
- Size
- 26-30cm