The effect of phosphoric acid concentration on resin tag length and bond strength of a photo-cured resin to acid-etched enamel

The cover of this title could differ from library to library.

Available with Digitized Contents Transmission Service

NDL Digital Collections

Available for viewing via the Digitized Contents Transmission Service for Individuals to official registered users of the NDL, who resides in Japan.

The effect of phosphoric acid concentration on resin tag length and bond strength of a photo-cured resin to acid-etched enamel

Notes on use

Search by Bookstore

Mina Search
- プレーンテキスト
  Registered users of Mina Search can download or stream this content.

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Material Type: 博士論文
Title: The effect of phosphoric acid concentration on resin tag length and bond strength of a photo-cured resin to acid-etched enamel
Author/Editor: M.J.Shinchi [著]
Author Heading: 新地田中, ハビエル稔シンチタナカ, ハビエルミノル
Publication, Distribution, etc.: [M.J.Shinchi]
Publication Date: [2000]
Publication Date (W3CDTF): 2000
Extent: 1冊
Alternative Title: エッチングに用いるリン酸濃度がレジンタグの長さ及び光硬化型レジンのエナメル質への接着強さに与える影響エッチングニモチイルリンサンノウドガレジンタグノナガサオヨビヒカリコウカガタレジンノエナメルシツエノセッチャクツヨサニアタエルエイキョウ
Degree grantor/type: 東京医科歯科大学
Date Granted: 平成12年3月23日
Date Granted (W3CDTF): 2000
Dissertation Number: 甲第1886号
Degree Type: 博士 (歯学)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: UT51
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-2001-R463
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000000415057
http://id.ndl.go.jp/bib/000000415057
Bibliographic Record Category (NDL): 213