図書

半導体研究 14 (超LSI技術 1 微細加工)

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半導体研究. 14 (超LSI技術 1 微細加工)

Call No. (NDL)
ND371-25
Bibliographic ID of National Diet Library
000001359439
Persistent ID (NDL)
info:ndljp/pid/12703399
Material type
図書
Author
半導体研究振興会 編
Publisher
工業調査会
Publication date
1977.12
Material Format
Paper・Digital
Capacity, size, etc.
376p ; 27cm
NDC
549
View All

Detailed bibliographic record

Contents：

フォトレジスト・電子線レジストの物理化学 津田穣著. 最近の微細加工用フォトレジスト材料 横田晃著. フォトマスク 柳川隆之,山本恭二,加藤宏著. フォトリソグラフィー 篠崎俊昭著. 電子線リソグラフィー 野々垣三郎著. X線リソグラフィー 中村正著. 位置制御 平野宰次,永島勝次著. イオンエッチ...

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Paper Digital

Material Type
図書
Title
半導体研究
Title Transcription
ハンドウタイ ケンキュウ
Volume
14 (超LSI技術 1 微細加工)
Author/Editor
半導体研究振興会 編
Author Heading
半導体研究振興会 ハンドウタイ ケンキュウ シンコウカイ ( 00279761 )Authorities
Publication, Distribution, etc.
東京 : 工業調査会
Publication Date
1977.12
Publication Date (W3CDTF)
1977
Extent
376p