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図書

微細加工とレジスト (高分子新素材one point ; 3)

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国立国会図書館デジタルコレクション

微細加工とレジスト(高分子新素材one point ; 3)

Call No. (NDL)
ND386-E9
Bibliographic ID of National Diet Library
000001889162
Persistent ID (NDL)
info:ndljp/pid/13666481
Material type
図書
Author
野々垣三郎 著
Publisher
共立出版
Publication date
1987.11
Material Format
Paper・Digital
Capacity, size, etc.
99p ; 19cm
NDC
549.7
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Notes on use

Note (General)：

叢書の編者: 高分子学会

Detailed bibliographic record

Summary, etc.：

半導体デバイスを制作する際の微細な加工に、どのようなレジスト（耐食性被膜材料）が使われ、また、新しく開発されているか、現状と将来を展望。(Provided by: 出版情報登録センター（JPRO）)

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Table of Contents

Provided by：出版情報登録センター（JPRO）Link to Help Page

  • 1．レジストを使う微細加工

  • 2．フォトレジスト

  • 3．電子線レジスト

  • 4．X線レジスト

  • 5．将来展望

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Northern Japan

  • 秋田県立図書館

    Paper
    Call No.：
    549.7/ﾉﾋﾞ/
    Book Registration Number：
    120237037
    秋田県立図書館

Kanto

  • 石川県立図書館

    Paper
    Call No.：
    578/15/3
    Book Registration Number：
    000676742
    石川県立図書館

  • 愛知県図書館

    Paper
    Call No.：
    549.7-ﾉﾉ-696931
    Book Registration Number：
    1106969319
    愛知県図書館

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Paper Digital

Material Type
図書
ISBN
4-320-04227-1
Title
微細加工とレジスト
Title Transcription
ビサイ カコウ ト レジスト
Author/Editor
野々垣三郎 著
Series Title
高分子新素材one point ; 3
Author Heading
野々垣, 三郎 ノノガキ, サブロウ ( 00160783 )Authorities
Publication, Distribution, etc.
東京 : 共立出版
Publication Date
1987.11
Publication Date (W3CDTF)
1987