図書
ImageImage

LSI製造におけるプロセス高性能化技術 3 (ULSIプロセス技術) (Ultra clean technology)

Icons representing 図書
The cover of this title could differ from library to library. Link to Help Page

LSI製造におけるプロセス高性能化技術. 3 (ULSIプロセス技術)(Ultra clean technology)

Call No. (NDL)
ND386-E105
Bibliographic ID of National Diet Library
000002057886
Persistent ID (NDL)
info:ndljp/pid/13649516
Material type
図書
Author
半導体基盤技術研究会 編
Publisher
リアライズ社
Publication date
1989.3
Material Format
Paper・Digital
Capacity, size, etc.
229p ; 27cm
NDC
549.7
View All

Notes on use

Note (General):

監修: 大見忠弘, 新田雄久

Search by Bookstore

Holdings of Libraries in Japan

This page shows libraries in Japan other than the National Diet Library that hold the material.

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

Kanto

Bibliographic Record

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Paper Digital

Material Type
図書
Title Transcription
エルエスアイ セイゾウ ニ オケル プロセス コウセイノウカ ギジュツ
Volume
3 (ULSIプロセス技術)
Author/Editor
半導体基盤技術研究会 編
Author Heading
半導体基盤技術研究会 ハンドウタイ キバン ギジュツ ケンキュウカイ ( 00264648 )Authorities
Publication, Distribution, etc.
Publication Date
1989.3
Publication Date (W3CDTF)
1989