Proceedings : the Third International Symposium on Sputtering & Plasma Processes, ISSP '95

Author: sponsored by the Study Committee of Sputtering & Plasma Processes, Japan Technology Transfer Associationほか

Notes on use

Note (General)：: "Symposium program" and 4 papers inserted.Includes bibliographical references.ISSN: 0917-2440

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Material Type: 図書
Title: Proceedings : the Third International Symposium on Sputtering & Plasma Processes, ISSP '95
Author/Editor: sponsored by the Study Committee of Sputtering & Plasma Processes, Japan Technology Transfer Association
with the cooperation of the Japan Society of Applied Physics ... [et al.]
Publication, Distribution, etc.: [Tokyo?] : the Committee
Publication Date: 1995
Publication Date (W3CDTF): 1995
Extent: vi, 442 p. : ill.
Size: 30 cm
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: M15
MC141
Target Audience: 一般
Note (General): "Symposium program" and 4 papers inserted.Includes bibliographical references.ISSN: 0917-2440
Holding library: 国立国会図書館
Call No.: M15-A9664
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000002471305
http://id.ndl.go.jp/bib/000002471305
National Bibliography No. (JPNO): 96033673
Cataloging Rule: Nippon Cataloging Rules, Preliminary New Edition
Bibliographic Record Category (NDL): 113