4th International Symposium on Plasma Chemistry : Topical Meeting on Interactions of Low Pressure Plasmas with Solid Surfaces : Round Table on Thermal Plasma Processing : conference proceedings, August 27 through September 1, 1979 / edited by S. Vepřek and J. Hertz.

• Material Type: 図書
• Title: 4th International Symposium on Plasma Chemistry : Topical Meeting on Interactions of Low Pressure Plasmas with Solid Surfaces : Round Table on Thermal Plasma Processing : conference proceedings, August 27 through September 1, 1979 / edited by S. Vepřek and J. Hertz.
• Author Heading: International Symposium on Plasma Chemistry (4th : 1979 : Zurich, Switzerland); Vepřek, S.; Hertz, J.; 国際純粋および応用化学連合 コクサイ ジュンスイ オヨビ オウヨウ カガク レンゴウ ( 00743370 )Authorities; Topical Meeting on Interactions of Low Pressure Plasmas with Solid Surfaces (1979 : Zurich, Switzerland); Round Table on Thermal Plasma Processing (1979 : Zurich, Switzerland)
• Publication, Distribution, etc.: Zurich, Switzerland : University of Zurich
• Publication Date: [1979]
• Publication Date (W3CDTF): 1979
• Extent: 2 v. : ill. ; 21 cm.
• Place of Publication (Country Code): CH
• Text Language Code: eng
• Subject Heading: Plasma chemistry -- Congresses.
• LCC: QD581
• DDC: 541/.0424
• NDLC: M15; PA
• Note (General): At head of title: ISPC-4; International Union of Pure and Applied Chemistry.
• Note (Bibliography): Includes bibliographical references and indexes.
• Holding library: 国立国会図書館
• Call No.: M15-A5134
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000003092334; http://id.ndl.go.jp/bib/000003092334
• LC Control Number: 81481907; https://lccn.loc.gov/81481907
• Cataloging Rule: Anglo-American Cataloging Rules
• Bibliographic Record Category (NDL): 211