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Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California / Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics. (Proceedings of SPIE--the International Society for Optical Engineering ; v. 471)

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Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California / Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.

(Proceedings of SPIE--the International Society for Optical Engineering ; v. 471)

Call No. (NDL)
M15-A4747
Bibliographic ID of National Diet Library
000003115578
Material type
図書
Author
Wagner, Alfred, 1950-ほか
Publisher
SPIE--the International Society for Optical Engineering
Publication date
c1984.
Material Format
Paper
Capacity, size, etc.
vi, 136 p. : ill. ; 28 cm.
NDC
-
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Paper

Material Type
図書
ISBN
0892525061 (pbk.)
Title
Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California / Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.
Series Title
Proceedings of SPIE--the International Society for Optical Engineering ; v. 471
Author Heading
Wagner, Alfred, 1950-
International Society for Hybrid Microelectronics.
Publication, Distribution, etc.
Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering
Publication Date
c1984.
Publication Date (W3CDTF)
1984
Extent
vi, 136 p. : ill. ; 28 cm.
Place of Publication (Country Code)
US