Proceedings of the Fifth Symposium on Plasma Processing / edited by G.S. Mathad, G.C. Schwartz, G. Smolinsky. (Proceedings)

Proceedings of the Fifth Symposium on Plasma Processing / edited by G.S. Mathad, G.C. Schwartz, G. Smolinsky.

(Proceedings)

Publisher: Dielectrics and Insulation and Electronics Divisions, Electrochemical Society

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Material Type: 図書
Title: Proceedings of the Fifth Symposium on Plasma Processing / edited by G.S. Mathad, G.C. Schwartz, G. Smolinsky.
Series Title: Proceedings
Author/Editor (Series Title): Electrochemical Society
v. 85-1
Title Heading: Proceedings (Electrochemical Society) ; v. 85-1.
Author Heading: Symposium on Plasma Processing (5th : 1984 : New Orleans, La.)
Mathad, G. S.
Schwartz, G. C.
Smolinsky, G.
Publication, Distribution, etc.: Pennington, NJ (10 S. Main St., Pennington 08534-2896) : Dielectrics and Insulation and Electronics Divisions, Electrochemical Society
Publication Date: c1985.
Publication Date (W3CDTF): 1985
Extent: x, 619 p. : ill. ; 23 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Plasma etching -- Congresses.
Semiconductors -- Etching -- Congresses.
LCC: TK7871.85
DDC: 621.3815/2
NDLC: M15
ND
Note (Bibliography): Includes bibliographies and indexes.
Holding library: 国立国会図書館
Call No.: M15-A1400
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000003125398
http://id.ndl.go.jp/bib/000003125398
LC Control Number: 85070593
https://lccn.loc.gov/85070593
Bibliographic Record Category (NDL): 211