Ultraclean surface processing of silicon wafers : secrets of VLSI manufacturing / Takeshi Hattori (ed.).

• Material Type: 図書
• ISBN: 3540616721 (alk. paper)
• Title: Ultraclean surface processing of silicon wafers : secrets of VLSI manufacturing / Takeshi Hattori (ed.).
• Author Heading: 服部, 毅 ハットリ, タケシ ( 00387302 )Authorities
• Publication, Distribution, etc.: Berlin : Springer; Tokyo : Springer
• Publication Date: c1998.
• Publication Date (W3CDTF): 1998
• Extent: xxviii, 616 p. : ill. ; 24 cm.
• Place of Publication (Country Code): DE
• Text Language Code: eng
• Subject Heading: シリコン (半導体) Sirikon (handotai); Semiconductor wafers -- Cleaning.; Silicon -- Surfaces.; Surface preparation.
• LCC: TK7871.85
• DDC: 621.3815/2
• NDLC: ND371
• Note (General): "Revised, updated and enlarged translation of the original Japanese edition, originally published in Japanese under the title: Silicon Wafer Hyomen no Clean-ka Gijutsu"--T.p. verso.
• Note (Bibliography): Includes bibliographical references and index.
• Holding library: 国立国会図書館
• Call No.: ND371-A28
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000003270900; http://id.ndl.go.jp/bib/000003270900
• LC Control Number: 98010353; https://lccn.loc.gov/98010353
• Bibliographic Record Category (NDL): 211

Table of Contents

Table of Contents

Part I．　Introduction

1．　Ultraclean Technology for VLSI Manufacturing: An Overview∈Takeshi Hattori/ 3

1．1　Introduction/ 3

1．2　Importance of Particle Reduction/ 4