5th international symposium on plasma process-induced damage : May 2000, Santa Clara, CA.

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Note (General)：: Extended abstracts.Also known as P2ID. IEEE cat no 00TH8479.Index term: plasma process induced damage ; process induced damage ; P2ID....

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Material Type: 図書
ISBN: 0965157741 (pbk)
Title: 5th international symposium on plasma process-induced damage : May 2000, Santa Clara, CA.
Author Heading: American Vacuum Society. Northern California Chapter.
Publication, Distribution, etc.: American Vacuum Society, Northern California Chapter
Publication Date: 2000.
Publication Date (W3CDTF): 2000
Extent: v.
Alternative Title: Also known as P2ID. IEEE cat no 00TH8479
plasma process induced damage ; process induced damage ; P2ID
NDLC: M17
Note (General): Extended abstracts.
Also known as P2ID. IEEE cat no 00TH8479.
Index term: plasma process induced damage ; process induced damage ; P2ID.
BL shelfmark: 4550.30255 5th 2000.
Holding library: 国立国会図書館
Call No.: M17-01-2372
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000003451149
http://id.ndl.go.jp/bib/000003451149
UKMARC No.: G07097618
Bibliographic Record Category (NDL): 215