Plasma process-induced damage : 3rd International symposium : Jun 1998, Honolulu, HI.

Author: Institute of Electrical and Electronics Engineers. Electron Divices Society (EDS)ほか

Notes on use

Note (General)：: Papers.Also known as P2ID. IEEE cat no 98EX100.Index term: P2ID ; plasma process induced damage ; IEEE ; JSAP....

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Material Type: 図書
ISBN: 0965157725 (pbk)
0780342666 (microfiche)
Title: Plasma process-induced damage : 3rd International symposium : Jun 1998, Honolulu, HI.
Author Heading: Institute of Electrical and Electronics Engineers. Electron Divices Society (EDS)
Japan Society of Applied Physics.
American Vacuum Society (AVS)
Publication, Distribution, etc.: American Vacuum Society
Publication Date: 1998.
Publication Date (W3CDTF): 1998
Extent: v.
Alternative Title: Also known as P2ID. IEEE cat no 98EX100
P2ID ; plasma process induced damage ; IEEE ; JSAP
NDLC: M17
ND
Note (General): Papers.
Also known as P2ID. IEEE cat no 98EX100.
Index term: P2ID ; plasma process induced damage ; IEEE ; JSAP.
BL shelfmark: 4550.30255 3rd 1998.
Holding library: 国立国会図書館
Call No.: M17-99-1512
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000003509056
http://id.ndl.go.jp/bib/000003509056
UKMARC No.: G05673798
Bibliographic Record Category (NDL): 215