22nd annual BACUS symposium on photomask technology : 1-4 October, 2002, Monterey, California, USA. : Oct 2002, Monterey, CA. (SPIE Proceedings ; 4889)

22nd annual BACUS symposium on photomask technology : 1-4 October, 2002, Monterey, California, USA. : Oct 2002, Monterey, CA.

(SPIE Proceedings ; 4889)

Call No. (NDL): M17-03-1175
Bibliographic ID of National Diet Library: 000004097463

Material type: 図書

Author: Society of Photo-Optical Instrumentation Engineers.ほか

Publisher: SPIE

Publication date: c2002.

Material Format: Paper

Capacity, size, etc.: 2 v. : ill. ; 28 cm.

NDC: -

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Note (General)：: Presentations and papers.

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Paper

Material Type: 図書
ISBN: 0819446750
ISSN (series): 0277-786X
Title: 22nd annual BACUS symposium on photomask technology : 1-4 October, 2002, Monterey, California, USA. : Oct 2002, Monterey, CA.
Series Title: SPIE Proceedings ; 4889
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 4889.
Author Heading: Society of Photo-Optical Instrumentation Engineers.
Grenon, Brian J.
Kimmel, Kurt R.
Symposium on Photomask Technology (22nd : 2002 : Monterey, Calif.)
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2002.
Publication Date (W3CDTF): 2002
Extent: 2 v. : ill. ; 28 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Integrated circuits -- Masks -- Congresses.
Microlithography -- Congresses.
NDLC: M17
Note (General): Presentations and papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-03-1175
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000004097463
http://id.ndl.go.jp/bib/000004097463
RLIN No.: NYCGAVH9628-B
Bibliographic Record Category (NDL): 215