Emerging lithographic technologies 7 : 25-27 February 2003 : Santa Clara, California, USA. : Feb 2003, Santa Clara, CA.

• Material Type: 図書
• ISBN: 0819448427
• ISSN (series): 0277-786X
• Title: Emerging lithographic technologies 7 : 25-27 February 2003 : Santa Clara, California, USA. : Feb 2003, Santa Clara, CA.
• Series Title: SPIE Proceedings ; 5037
• Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering. v. 5037.
• Author Heading: Semiconductor Equipment and Materials International (SEMI); Engelstad, Roxann L.; International SEMATECH.
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2003.
• Publication Date (W3CDTF): 2003
• Extent: 2 parts : ill. ; 28 cm.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Lithography, Electron beam -- Congresses.; Microlithography -- Industrial applications -- Congresses.; X-ray lithography -- Congresses.; X-rays -- Industrial applications -- Congresses.; Masks (Electronics) -- Congresses.
• NDLC: M17
• Note (General): Papers.
• Note (Bibliography): Includes bibliographic references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-04-204
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000004190073; http://id.ndl.go.jp/bib/000004190073
• RLIN No.: MOHG52543912-B
• Bibliographic Record Category (NDL): 215