Advances in resist technology and processing 20 : 24-26 February 2003 : Santa Clara, California, USA. : 20th annual SPIE conference on advances in resist technology and processing : Feb 2003, Santa Clara, CA. (SPIE Proceedings ; 5039)

Advances in resist technology and processing 20 : 24-26 February 2003 : Santa Clara, California, USA. : 20th annual SPIE conference on advances in resist technology and processing : Feb 2003, Santa Clara, CA.

(SPIE Proceedings ; 5039)

Call No. (NDL): M17-04-259
Bibliographic ID of National Diet Library: 000004190132

Material type: 図書

Author: International SEMATECH.ほか

Publisher: SPIE

Publication date: c2003.

Material Format: Paper

Capacity, size, etc.: 2 parts : ill. ; 28 cm.

NDC: -

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Notes on use

Note (General)：: Papers.

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Paper

Material Type: 図書
ISBN: 0819448443
ISSN (series): 0277-786X
Title: Advances in resist technology and processing 20 : 24-26 February 2003 : Santa Clara, California, USA. : 20th annual SPIE conference on advances in resist technology and processing : Feb 2003, Santa Clara, CA.
Series Title: SPIE Proceedings ; 5039
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering. v. 5039.
Author Heading: International SEMATECH.
Fedynyshyn, Theodore H., 1952-
Semiconductor Equipment and Materials International (SEMI)
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2003.
Publication Date (W3CDTF): 2003
Extent: 2 parts : ill. ; 28 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Photoresists -- Congresses.
Microlithography -- Congresses.
NDLC: M17
Note (General): Papers.
Note (Bibliography): Includes bibliographic references and author index.
Holding library: 国立国会図書館
Call No.: M17-04-259
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000004190132
http://id.ndl.go.jp/bib/000004190132
RLIN No.: MOHG52544187-B
Bibliographic Record Category (NDL): 215