Fundamental gas-phase and surface chemistry of vapor-phase deposition 2 : and : process control, diagnostics, and modeling in semiconductor manufacturing 4 : proceedings of the internatioal symposia. : ------. (PV ; 01-13)

Fundamental gas-phase and surface chemistry of vapor-phase deposition 2 : and : process control, diagnostics, and modeling in semiconductor manufacturing 4 : proceedings of the internatioal symposia. : ------.

(PV ; 01-13)

Call No. (NDL): M17-03-4580
Bibliographic ID of National Diet Library: 000004244016

Material type: 図書

Author: Swihart, Mark T.ほか

Publisher: Electrochemical Society, Inc.

Publication date: c2001.

Material Format: Paper

Capacity, size, etc.: ix, 508 p. : ill. ; 26 cm.

NDC: -

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Notes on use

Note (General)：: Papers."High Temperature Materials and Dielectric Science and Technology Divisions" -- t. p.

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Paper

Material Type: 図書
ISBN: 1566773199
Title: Fundamental gas-phase and surface chemistry of vapor-phase deposition 2 : and : process control, diagnostics, and modeling in semiconductor manufacturing 4 : proceedings of the internatioal symposia. : ------.
Series Title: PV ; 01-13
Title Heading: Proceedings (Electrochemical Society) ; v. 2001-13.
Author Heading: Swihart, Mark T.
Allendorf, Mark Donald.
Meyyapan, M.
Symposium on Fundamental Gas-Phase and Surface Chemistry of Vaper-Phase Materials Synthesis (2nd : 2001 : Washington, D.C.)
Publication, Distribution, etc.: Pennington : Electrochemical Society, Inc.
Publication Date: c2001.
Publication Date (W3CDTF): 2001
Extent: ix, 508 p. : ill. ; 26 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Surface chemistry -- Congresses.
Gases, Ionized -- Congresses.
Chemical vapor deposition -- Congresses.
NDLC: M17
Note (General): Papers.
"High Temperature Materials and Dielectric Science and Technology Divisions" -- t. p.
Note (Bibliography): Incudes bibliographical references and indexes.
Holding library: 国立国会図書館
Call No.: M17-03-4580
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000004244016
http://id.ndl.go.jp/bib/000004244016
LC Control Number: 2001092515
https://lccn.loc.gov/2001092515
RLIN No.: CUBGGLAD184905560-B
Bibliographic Record Category (NDL): 215