図書

Metrology, inspection, and process control for microlithography 15 : 26 February-1 March 2001 : Santa Clara, USA. : Mar 2001, Santa Clara, CA. (SPIE Proceedings ; 4344)

Icons representing 図書

Metrology, inspection, and process control for microlithography 15 : 26 February-1 March 2001 : Santa Clara, USA. : Mar 2001, Santa Clara, CA.

(SPIE Proceedings ; 4344)

Call No. (NDL)
M17-03-4943
Bibliographic ID of National Diet Library
000004247579
Material type
図書
Author
Semiconductor Equipment and Materials International (SEMI)ほか
Publisher
SPIE
Publication date
c2001.
Material Format
Paper
Capacity, size, etc.
xxv, 876 p. : ill. ; 28 cm.
NDC
-
View All

Notes on use

Note (General)：

Papers.

Search by Bookstore

Search by Bookstore

Holdings of Libraries in Japan

This page shows libraries in Japan other than the National Diet Library that hold the material.

List of Cooperating Institutions and Databases

Please contact your local library for information on how to use materials or whether it is possible to request materials from the holding libraries.

other

  • CiNii Research

    Search Service
    Paper
    You can check the holdings of institutions and databases with which CiNii Research is linked at the site of CiNii Research.
    Check the holdings of this book

Search by Bookstore

Bibliographic Record

You can check the details of this material, its authority (keywords that refer to materials on the same subject, author's name, etc.), etc.

Paper

Material Type
図書
ISBN
0819440302
ISSN (series)
0277-786X
Title
Metrology, inspection, and process control for microlithography 15 : 26 February-1 March 2001 : Santa Clara, USA. : Mar 2001, Santa Clara, CA.
Series Title
SPIE Proceedings ; 4344
Title Heading
Proceedings of SPIE -- the International Society for Optical Engineering ; v. 4344.
Author Heading
Semiconductor Equipment and Materials International (SEMI)
Sullivan, Neal T.
International SEMATECH.
Publication, Distribution, etc.
Bellingham : SPIE
Publication Date
c2001.
Publication Date (W3CDTF)
2001