Advances in resist technology and processing 18 : 26-28 February 2001 : Santa Clara, USA. : 18th annual SPIE conference on advances in resist technology and processing : Feb 2001, Santa Clara, CA. (SPIE Proceedings ; 4345)

Advances in resist technology and processing 18 : 26-28 February 2001 : Santa Clara, USA. : 18th annual SPIE conference on advances in resist technology and processing : Feb 2001, Santa Clara, CA.

(SPIE Proceedings ; 4345)

Call No. (NDL): M17-03-4946
Bibliographic ID of National Diet Library: 000004247611

Material type: 図書

Author: Semiconductor Equipment and Materials International (SEMI)ほか

Publisher: SPIE

Publication date: c2001.

Material Format: Paper

Capacity, size, etc.: 2 parts : ill. ; 28 cm.

NDC: -

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Note (General)：: Papers.

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Paper

Material Type: 図書
ISBN: 0819440310
ISSN (series): 0277-786X
Title: Advances in resist technology and processing 18 : 26-28 February 2001 : Santa Clara, USA. : 18th annual SPIE conference on advances in resist technology and processing : Feb 2001, Santa Clara, CA.
Series Title: SPIE Proceedings ; 4345
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 4345.
Author Heading: Semiconductor Equipment and Materials International (SEMI)
Houlihan, Francis M.
International SEMATECH.
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2001.
Publication Date (W3CDTF): 2001
Extent: 2 parts : ill. ; 28 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Photoresists -- Congresses.
Microlithography -- Congresses.
LCC: TR940
DDC: 621.3815/31
NDLC: M17
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-03-4946
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000004247611
http://id.ndl.go.jp/bib/000004247611
LC Control Number: 2002283519
https://lccn.loc.gov/2002283519
RLIN No.: DCLC2002283519-B
Bibliographic Record Category (NDL): 215