In situ analysis of thin film deposition processes using time-of-flight (TOF) ion beam analysis methods ANL/CHM/CP-85678 DE95 013546 CONF-95051223

In situ analysis of thin film deposition processes using time-of-flight (TOF) ion beam analysis methods

ANL/CHM/CP-85678 DE95 013546 CONF-95051223

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Material Type: 規格・テクニカルリポート類
Title: In situ analysis of thin film deposition processes using time-of-flight (TOF) ion beam analysis methods
Author/Editor: Im, J
Krauss, A. R
Gruen, D. M
Lin, Y
Schultz, J. A
Publication Date: 1995
Publication Date (W3CDTF): 1995
Extent: 29 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : ANL/CHM/CP-85678
テクニカルリポート番号 : DE95 013546
テクニカルリポート番号 : CONF-95051223
Holding library: 国立国会図書館
Call No.: LS-DE95/013546
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005539269
http://id.ndl.go.jp/bib/000005539269
Bibliographic Record Category (NDL): 291