Optimization of x-ray sources for proximity lithography produced by a high average power Nd:glass laser. Revision 1 UCRL-CR-121294-Rev.1 DE96 004050

Optimization of x-ray sources for proximity lithography produced by a high average power Nd:glass laser. Revision 1

UCRL-CR-121294-Rev.1 DE96 004050

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Material Type: 規格・テクニカルリポート類
Title: Optimization of x-ray sources for proximity lithography produced by a high average power Nd:glass laser. Revision 1
Author/Editor: Celliers, P
DaSilva, L. B
Dane, C. B
Publication Date: 1995
Publication Date (W3CDTF): 1995
Extent: 51 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : UCRL-CR-121294-Rev.1
テクニカルリポート番号 : DE96 004050
Holding library: 国立国会図書館
Call No.: LS-DE96/004050
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005544277
http://id.ndl.go.jp/bib/000005544277
Bibliographic Record Category (NDL): 291