Chemical vapor deposition of ternary refractory nitrides for diffusion barrier applications SAND-96-0701C DE96 011817 CONF-96061042

Chemical vapor deposition of ternary refractory nitrides for diffusion barrier applications

SAND-96-0701C DE96 011817 CONF-96061042

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Material Type: 規格・テクニカルリポート類
Title: Chemical vapor deposition of ternary refractory nitrides for diffusion barrier applications
Author/Editor: Smith, P. M
Custer, J. S
Fleming, J. G
Roherty-Osmun, E
Cohn, M
Publication Date: 1996
Publication Date (W3CDTF): 1996
Extent: 6 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : SAND-96-0701C
テクニカルリポート番号 : DE96 011817
テクニカルリポート番号 : CONF-96061042
Holding library: 国立国会図書館
Call No.: LS-DE96/011817
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005855450
http://id.ndl.go.jp/bib/000005855450
Bibliographic Record Category (NDL): 291