Development of XRMF techniques for measurement of multi-layer film thicknesses on semiconductors for VLSI and ULSI integrated circuits. Final CRADA report for CRADA number Y-1292-0130. PROGRESS REPT Y/AMT-454 DE97 008830

Development of XRMF techniques for measurement of multi-layer film thicknesses on semiconductors for VLSI and ULSI integrated circuits. Final CRADA report for CRADA number Y-1292-0130. PROGRESS REPT

Y/AMT-454 DE97 008830

Call No. (NDL): LS-DE97/008830
Bibliographic ID of National Diet Library: 000005883787

Material type: 規格・テクニカルリポート類

Author: Carpenter, D. Aほか

Publisher: -

Publication date: 1997

Material Format: Microform

Capacity, size, etc.: 7 p. (1 microfiche)

NDC: -

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Microform

Material Type: 規格・テクニカルリポート類
Title: Development of XRMF techniques for measurement of multi-layer film thicknesses on semiconductors for VLSI and ULSI integrated circuits. Final CRADA report for CRADA number Y-1292-0130. PROGRESS REPT
Author/Editor: Carpenter, D. A
Golijanin, D. L
Wherry, D
Publication Date: 1997
Publication Date (W3CDTF): 1997
Extent: 7 p. (1 microfiche)
Note (Material Type): [microform]
Report No.: テクニカルリポート番号 : Y/AMT-454
テクニカルリポート番号 : DE97 008830
Holding library: 国立国会図書館
Call No.: LS-DE97/008830
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000005883787
http://id.ndl.go.jp/bib/000005883787
Bibliographic Record Category (NDL): 291