図書

Photomask and next-generation lithography mask technology 11 : 14-16 April 2004 : Yokohama, Japan. : photomask Japan 2004 symposium : Apr 2004, Yokohama, Japan. (SPIE Proceedings ; 5446)

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Photomask and next-generation lithography mask technology 11 : 14-16 April 2004 : Yokohama, Japan. : photomask Japan 2004 symposium : Apr 2004, Yokohama, Japan.

(SPIE Proceedings ; 5446)

Call No. (NDL)
M17-04-3669
Bibliographic ID of National Diet Library
000007524072
Material type
図書
Author
Institute of Electrical Engineers of Japan.ほか
Publisher
SPIE
Publication date
c2004.
Material Format
Paper
Capacity, size, etc.
2 parts : ill. (some col.) ; 28 cm.
NDC
-
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Notes on use

Note (General)：

Papers." (...) 11th international symposium on this topic held in Japan." -- p. xxiii.

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Paper

Material Type
図書
ISBN (set)
0819453692 (set)
ISSN (series)
0277-786X
Title
Photomask and next-generation lithography mask technology 11 : 14-16 April 2004 : Yokohama, Japan. : photomask Japan 2004 symposium : Apr 2004, Yokohama, Japan.
Series Title
SPIE Proceedings ; 5446
Title Heading
Proceedings of SPIE; v. 5446.
Author Heading
Institute of Electrical Engineers of Japan.
Tanabe, Hiroyoshi.
Publication, Distribution, etc.
Bellingham : SPIE
Publication Date
c2004.
Publication Date (W3CDTF)
2004