2003 8th international symposium on plasma- and process-induced damage : April 24-25, 2003 : Corbeil-Essonnes, France. : Apr 2003, Corbeil-Essonnes, France.

• Material Type: 図書
• ISBN: 0780377478 (softbound ed.)
• Title: 2003 8th international symposium on plasma- and process-induced damage : April 24-25, 2003 : Corbeil-Essonnes, France. : Apr 2003, Corbeil-Essonnes, France.
• Author Heading: Eriguchi, Koji.; Kishnan, S.; Hook, Terence.; International Symposium on Plasma Process-Induced Damage (8th : 2003 : Corbeil-Essonnes, France)
• Publication, Distribution, etc.: Piscataway : IEEE
• Publication Date: c2003.
• Publication Date (W3CDTF): 2003
• Extent: 189 p. : ill. ; 28 cm.
• Alternative Title: P2ID : international symposium on plasma- & process-induced damage : April 24-25, 2003 : Altis Semiconductor : Corbeil-Essonnes, France
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Semiconductor wafers -- Congresses.; Semiconductors -- Effect of radiation on -- Congresses.; Plasma radiation -- Congresses.
• NDLC: M17
• Note (General): Papers.; IEEE cat no 03TH8669.
• Note (Bibliography): Includes bibliographical references.
• Holding library: 国立国会図書館
• Call No.: M17-05-2180
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000007917575; http://id.ndl.go.jp/bib/000007917575
• LC Control Number: 2002116918; https://lccn.loc.gov/2002116918
• RLIN No.: MOHG52192967-B
• Bibliographic Record Category (NDL): 215