Novel nitridation technique using atmospheric pressure plasma : formation mechanism of ultrathin silicon nitride film and the dielectric property

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Material Type: 博士論文
Title: Novel nitridation technique using atmospheric pressure plasma : formation mechanism of ultrathin silicon nitride film and the dielectric property
Author/Editor: Ryoma Hayakawa [著]
Author Heading: 早川, 竜馬ハヤカワ, リョウマ
Publication, Distribution, etc.: [Ryoma Hayakawa]
Publication Date: 2006
Publication Date (W3CDTF): 2006
Extent: 1冊
Alternative Title: 大気圧プラズマを用いた新規な窒化技術 : 極薄シリコン窒化膜の形成機構とその誘電特性タイキアツプラズマオモチイタシンキナチッカギジュツ : ゴクウスシリコンチッカマクノケイセイキコウトソノユウデントクセイ
Degree grantor/type: 大阪府立大学
Date Granted: 平成18年3月31日
Date Granted (W3CDTF): 2006
Dissertation Number: 甲第964号
Degree Type: 博士 (工学)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: UT51
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-2006-E684
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000008199216
http://id.ndl.go.jp/bib/000008199216
Bibliographic Record Category (NDL): 213