図書

Materials, technology and reliability of low-k dielectrics and copper interconnects : symposium held April 18-21, 2006, San Francisco, California, U.S.A. : symposium F, "materials, technology and reliability of low-k dielectrics and copper interconnects" : 2006 MRS spring meeting : Apr 2006, San Francisco, CA. (Materials Research Society Symposia Proceedings ; 914)

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Materials, technology and reliability of low-k dielectrics and copper interconnects : symposium held April 18-21, 2006, San Francisco, California, U.S.A. : symposium F, "materials, technology and reliability of low-k dielectrics and copper interconnects" : 2006 MRS spring meeting : Apr 2006, San Francisco, CA.

(Materials Research Society Symposia Proceedings ; 914)

Call No. (NDL)
M17-06-2842
Bibliographic ID of National Diet Library
000008355076
Material type
図書
Author
Tsui, Ting Y.ほか
Publisher
Materials Research Society
Publication date
c2006.
Material Format
Paper
Capacity, size, etc.
xvii, 462 p. : ill. ; 24 cm.
NDC
-
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Paper

Material Type
図書
ISBN (error code)
9781558998705
Publication, Distribution, etc.
Publication Date
c2006.
Publication Date (W3CDTF)
2006
Extent
xvii, 462 p. : ill. ; 24 cm.