Optical microlithography 20 : 27 February-2 March 2007 : San Jose, California, USA. : Feb 2007, San Jose, CA. (SPIE Proceedings ; 6520)

Optical microlithography 20 : 27 February-2 March 2007 : San Jose, California, USA. : Feb 2007, San Jose, CA.

(SPIE Proceedings ; 6520)

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Material Type: 図書
ISBN (set): 9780819466396 (set)
ISSN (series): 0277-786X
Title: Optical microlithography 20 : 27 February-2 March 2007 : San Jose, California, USA. : Feb 2007, San Jose, CA.
Series Title: SPIE Proceedings ; 6520
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 6520.
Author Heading: SEMATECH, Inc.
Flagello, Donis G.
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2007.
Publication Date (W3CDTF): 2007
Extent: 3 parts : ill. (some col.) ; 28 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Integrated circuits -- Masks -- Congresses.
Microlithography -- Congresses.
X-ray lithography -- Congresses.
Manufacturing processes -- Congresses.
NDLC: M17
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-07-1777
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000008715746
http://id.ndl.go.jp/bib/000008715746
OCLC No.: 144608806
https://www.worldcat.org/oclc/144608806
Bibliographic Record Category (NDL): 215