Study of ruthenium films deposited by MOCVD and its application to the electrodes of ferroelectric memories

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Note (General)：: 博士論文標題紙のタイトル: Study of ruthenium films deposited by metalorganic chemical vapor deposition and its application to the electrodes of ferroelectric memo...

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Material Type: 博士論文
Title: Study of ruthenium films deposited by MOCVD and its application to the electrodes of ferroelectric memories
Author/Editor: Taisuke Furukawa [著]
Author Heading: 古川, 泰助フルカワ, タイスケ
Publication, Distribution, etc.: [Taisuke Furukawa]
Publication Date: [2007]
Publication Date (W3CDTF): 2007
Extent: 1冊
Degree grantor/type: 東京工業大学
Date Granted: 平成19年6月30日
Date Granted (W3CDTF): 2007
Dissertation Number: 乙第3924号
Degree Type: 博士 (工学)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Text Language Code: eng
NDLC: UT51
Note (General): 博士論文
標題紙のタイトル: Study of ruthenium films deposited by metalorganic chemical vapor deposition and its application to the electrodes of ferroelectric memories
Holding library: 国立国会図書館
Call No.: UT51-2008-M478
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000009905014
http://id.ndl.go.jp/bib/000009905014
Bibliographic Record Category (NDL): 213