Optical microlithography 22 : 24-27 February 2009 : San Jose, California, United States. : SPIE optical microlithography 2009 conference : Feb 2009, San Jose, CA. (SPIE Proceedings ; 7274)

Optical microlithography 22 : 24-27 February 2009 : San Jose, California, United States. : SPIE optical microlithography 2009 conference : Feb 2009, San Jose, CA.

(SPIE Proceedings ; 7274)

Call No. (NDL): M17-09-2147
Bibliographic ID of National Diet Library: 000010230920

Material type: 図書

Author: SEMATECH, Inc.ほか

Publisher: SPIE

Publication date: c2009.

Material Format: Paper

Capacity, size, etc.: 2 parts : ill. ; 28 cm.

NDC: -

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Note (General)：: Papers.

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Paper

Material Type: 図書
ISBN (set): 9780819475275 (set)
ISSN (series): 0277-786X
Title: Optical microlithography 22 : 24-27 February 2009 : San Jose, California, United States. : SPIE optical microlithography 2009 conference : Feb 2009, San Jose, CA.
Series Title: SPIE Proceedings ; 7274
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 7274.
Author Heading: SEMATECH, Inc.
Levinson, Harry J.
Dusa, Mircea V.
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2009.
Publication Date (W3CDTF): 2009
Extent: 2 parts : ill. ; 28 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Integrated circuits -- Masks -- Congresses.
Microlithography -- Congresses.
X-ray lithography -- Congresses.
Manufacturing processes -- Congresses.
NDLC: M17
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-09-2147
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000010230920
http://id.ndl.go.jp/bib/000010230920
OCLC No.: 325000265
https://www.worldcat.org/oclc/325000265
Bibliographic Record Category (NDL): 215