Advances in resist materials and processing technology 26 : 23-25 February 2009 : San Jose, California, United States. : Feb 2009, San Jose, CA. (SPIE Proceedings ; 7273)

Advances in resist materials and processing technology 26 : 23-25 February 2009 : San Jose, California, United States. : Feb 2009, San Jose, CA.

(SPIE Proceedings ; 7273)

Call No. (NDL): M17-10-82
Bibliographic ID of National Diet Library: 000010270542

Material type: 図書

Author: SEMATECH, Inc.ほか

Publisher: SPIE

Publication date: c2009.

Material Format: Paper

Capacity, size, etc.: 2 parts : ill. (some col.) ; 28 cm.

NDC: -

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Notes on use

Note (General)：: Papers.

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Paper

Material Type: 図書
ISBN (set): 9780819475268 (set)
ISSN (series): 0277-786X
Title: Advances in resist materials and processing technology 26 : 23-25 February 2009 : San Jose, California, United States. : Feb 2009, San Jose, CA.
Series Title: SPIE Proceedings ; 7273
Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 7273.
Author Heading: SEMATECH, Inc.
Henderson, Clifford L.
Publication, Distribution, etc.: Bellingham : SPIE
Publication Date: c2009.
Publication Date (W3CDTF): 2009
Extent: 2 parts : ill. (some col.) ; 28 cm.
Place of Publication (Country Code): US
Text Language Code: eng
Subject Heading: Photoresists -- Congresses.
Microlithography -- Congresses.
NDLC: M17
Note (General): Papers.
Note (Bibliography): Includes bibliographical references and author index.
Holding library: 国立国会図書館
Call No.: M17-10-82
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000010270542
http://id.ndl.go.jp/bib/000010270542
OCLC No.: 355149683
https://www.worldcat.org/oclc/355149683
Bibliographic Record Category (NDL): 215