Growth and characterizations of a series of semiconducting silicide layers based on the reactive deposition techniques

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Material Type: 博士論文
Title: Growth and characterizations of a series of semiconducting silicide layers based on the reactive deposition techniques
Author/Editor: Junhua Hu [著]
Author Heading: 胡, 俊華コ, シュンカ
Publication, Distribution, etc.: [Junhua Hu]
Publication Date: [2009]
Publication Date (W3CDTF): 2009
Extent: 1冊
Alternative Title: 熱反応堆積法によるシリサイド半導体薄膜の成長及び評価ネツハンノウタイセキホウニヨルシリサイドハンドウタイハクマクノセイチョウオヨビヒョウカ
Degree grantor/type: 静岡大学
Date Granted: 平成21年9月29日
Date Granted (W3CDTF): 2009
Dissertation Number: 甲第608号
Degree Type: 博士 (工学)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Text Language Code: eng
Alias of Author: Hu, Junhua
NDLC: UT51
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-2009-S625
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000010820764
http://id.ndl.go.jp/bib/000010820764
Bibliographic Record Category (NDL): 213