Crystallographic and dielectric properties of ZrO2 films epitaxially grown by limited reaction sputtering

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Material Type: 博士論文
Title: Crystallographic and dielectric properties of ZrO2 films epitaxially grown by limited reaction sputtering
Author/Editor: Ying Zhou [著]
Author Heading: 周, 英ツォウ, イン
Publication, Distribution, etc.: [Ying Zhou]
Publication Date: [2009]
Publication Date (W3CDTF): 2009
Extent: 1冊
Alternative Title: 制限反応スパッタ法によるZrO2薄膜のエピタキシャル成長とその結晶学的・誘電的特性セイゲンハンノウスパッタホウニヨル ZrO2 ハクマクノエピタキシャルセイチョウトソノケッショウガクテキユウデンテキトクセイ
Degree grantor/type: 金沢大学
Date Granted: 平成21年9月28日
Date Granted (W3CDTF): 2009
Dissertation Number: 甲第3348号
Degree Type: 博士 (工学)
Note (Dissertation): 博士論文
Place of Publication (Country Code): JP
Text Language Code: eng
Alias of Author: Zhou, Ying
NDLC: UT51
Note (General): 博士論文
Holding library: 国立国会図書館
Call No.: UT51-2010-H781
Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書
https://ndlsearch.ndl.go.jp
Bibliographic ID (NDL): 000011005949
http://id.ndl.go.jp/bib/000011005949
Bibliographic Record Category (NDL): 213