Extreme ultraviolet (EUV) lithography 2 : 28 February-3 March 2011 : San Jose, California, United States : 2nd SPIE conference on extreme ultraviolet (EUV) lithography : Feb 2011, San Jose, CA.

• Material Type: 図書
• ISBN (set): 9780819485281 (pbk. : set)
• ISSN (series): 0277786X
• Title: Extreme ultraviolet (EUV) lithography 2 : 28 February-3 March 2011 : San Jose, California, United States : 2nd SPIE conference on extreme ultraviolet (EUV) lithography : Feb 2011, San Jose, CA.
• Series Title: SPIE Proceedings ; 7969
• Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 7969.
• Author Heading: La Fontaine, Bruno M.; Naulleau, Patrick P. (Patrick Pascal)
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2011.
• Publication Date (W3CDTF): 2011
• Extent: 2 parts
• Other physical details: ill.
• Size: 28 cm.
• Additional Title: SPIE advanced lithography.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Subject Heading: Extreme ultraviolet lithography--Congresses.; Ultraviolet radiation--Industrial applications--Congresses.; Lasers--Industrial applications--Congresses.; Photolithography--Congresses.; Optical coatings--Congresses.; Extreme ultraviolet lithography; EUV
• LCC: TK7872.M3
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-12-322
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000011254276; http://id.ndl.go.jp/bib/000011254276
• OCLC No.: 751794175; https://www.worldcat.org/oclc/751794175
• Cataloging Rule: Anglo-American Cataloging Rules
• Bibliographic Record Category (NDL): 215