Advances in resist materials and processing technology 28 : 28 February-2 March 2011 : San Jose, California, United States : Feb 2011, San Jose, CA.

• Material Type: 図書
• ISBN (set): 9780819485311 (set)
• ISSN (series): 0277786X
• Title: Advances in resist materials and processing technology 28 : 28 February-2 March 2011 : San Jose, California, United States : Feb 2011, San Jose, CA.
• Series Title: SPIE Proceedings ; 7972
• Title Heading: Proceedings of SPIE -- the International Society for Optical Engineering ; v. 7972.
• Author Heading: Allen, Robert D.; Somervell, Mark Howell, 1973-
• Publication, Distribution, etc.: Bellingham : SPIE
• Publication Date: c2011.
• Publication Date (W3CDTF): 2011
• Extent: 2 parts
• Other physical details: ill. (some col.)
• Size: 28 cm.
• Additional Title: SPIE advanced lithography.
• Place of Publication (Country Code): US
• Text Language Code: eng
• Genre/Form Terms: Electronic books.
• Subject Heading: Photoresists--Congresses.; Microlithography--Congresses.; Resist materials; Novel materials; Processing technology
• LCC: TK7874
• NDLC: M17
• Target Audience: 一般
• Note (General): Papers.
• Note (Bibliography): Includes bibliographical references and author index.
• Holding library: 国立国会図書館
• Call No.: M17-12-326
• Data Provider (Database): 国立国会図書館 : 国立国会図書館蔵書; https://ndlsearch.ndl.go.jp
• Bibliographic ID (NDL): 000011254294; http://id.ndl.go.jp/bib/000011254294
• OCLC No.: 751794157; https://www.worldcat.org/oclc/751794157
• Cataloging Rule: Anglo-American Cataloging Rules
• Bibliographic Record Category (NDL): 215